Entegris Inc. in materials integrity management introduced the solution to help semiconductor manufacturers that can address the quality and cost issues associated with reticle haze in 193 nm lithography.
The company plans to expand its Clarilite certified offerings to include new products and services that ensure that reticles are maintained in a controlled environment throughout the reticle life cycle. In addition to its 193 nm reticle haze prevention solutions, the company also plans to provide gas purifiers on lithography tools, airborne molecular contaminant control filters, and related products and services, to help keep the lithography area clean of contaminants.
Dave Ruede, director of product marketing for Entegris' gas microcontamination business, said, "The cost of defects on reticles is due to haze formation can be exorbitant, and it's an acute problem in fabs with deep ultraviolet (DUV) lithography tools."
