Next generation 300mm FT-IR metrology tool featuring the highest cleanliness standards for mini-environments
(Technology News, 23 Jul 2007 )
Thermo Fisher Scientific has introduced its latest FT-IR metrology system, the Thermo Scientific ECO 3500. Incorporating a unique Spartan equipment front-end solution from Asyst Technologies Inc., a leading supplier of integrated automation systems that enhance semiconductor manufacturing productivity, the ECO 3500 benefits from the highest industry standards of cleanliness in microenvironments. Also featuring a proven spectrometer and enhanced analytical software, the ECO 3500 is designed for seamless integration into automated wafer handling facilities.
The ECO 3500 is a complete lab-to-FAB solution. An enhanced software interface provides full SEMI E95 compliant access for process engineering, research and production monitoring applications. Improved wafer handling capabilities include two in-line load ports and a new high precision edge grip stage that brings an even higher degree of accuracy and repeatability to the product line. The ECO 3500 is the only FT-IR metrology tool to utilize Asyst Technologies’ new, state of the art EFEM rated ISO class 1 for particle contamination, exceptional operational speed and simplified mechanical design. The unique dual end-effector configuration with two 300mm in-line load ports speed up the wafer transfer process between the FOUP (front opening unified pod) and the wafer stage and optimizes sample throughput.
Installation of the Thermo Scientific ECO 3500 is much improved with an air-cooled infrared source in place of the conventional use of cooling water. Reliability is enhanced through the use of a KBr Beamsplitter mounted in a purged housing. The ECO 3500 is capable of undertaking a wide range of chemical analyses including ppm level measurement of carbon and oxygen in silicon, weight percent level measurement of dielectric films such as boron or phosphorus in BPSG (borophosphosilicate glass) and compositional analysis of hydrogen in silicon nitride and oxy-nitride films. The spectrometer is also suitable for several key dimensional measurements such as epitaxial film thickness and SOI or MEMS thickness.
