Synopsys, Inc. and UMC have announced that the two companies have collaborated to add new capabilities to the reference design flow based on Synopsys' Galaxy Design Platform for UMC's 90-nanometer (nm) process.
"Our successful partnership with Synopsys gives our customers access to a validated 90nm reference flow that reduces risk and speeds time to market," said Ken Liou, director of the IP and Design Support division at UMC. "Our continued collaboration with Synopsys Professional Services ensures that the performance and capabilities of the Galaxy Design Platform will work smoothly in UMC's most advanced process flows."
"Synopsys works closely with world-class foundries like UMC to ensure that our mutual customers have access to a proven flow that targets low power and DFM requirements," said Rich Goldman, vice president of Strategic Market Development at Synopsys. "This collaboration helps ensure that Synopsys' Galaxy Design Platform offers UMC customers a complete, reliable RTL-to-GDSII design flow. We will continue to work with UMC to address future challenges as we move to even deeper submicron processes."
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