Pixer Technology intros CDC200 and Galileo systems
(Product News, 28 Feb 2008 )
Pixer Technology has introduced two new tools at SPIE Advanced Lithography in San Jose.
The CDC200, the next generation of Pixer’s high-resolution Critical Dimension Control (CDC) solutions, enables both mask makers and IC manufacturers to control their Critical Dimensions, and significantly improve global and local CD uniformity across masks and wafers. These improvements are achieved through the selective modification of the mask transmission profile with partially scattering Shade-In Elements.
Pixer is also introducing Galileo, the industry’s first high speed, high-resolution DUV metrology tool. Galileo, enables measurement of DUV transmission with a better than 0.1% resolution. Measurements can be made on both quartz and MoSi coated blanks. Of course, sensitivity does not come at the expense of speed: over 1000 sample points can be measured in under 20 minutes.
