Calibre nmOPC on Cell/B.E. platform qualified for production at IBM
( 01 Jun 2008 )
Mentor Graphics’s Calibre nmOPC and OPCverify computational lithography tools accelerated with Cell Broadband Engine (Cell/B.E.) processor technology have been qualified for production at IBM for 45nm and smaller process nodes. This was done to improve critical mask layer time-to-market, while maintaining acceptable total cost of computing for 45nm and 32nm designs. Cell/B.E. multi-core technology is a great fit for computational lithography due to its ability to accelerate the image simulation and Fast Fourier Transformation processing used in nmOPC.
