Photomask supplier Photronics Inc. says it is remaining proactive in helping to develop imprint lithography, specifically working on the related template technology.
"One concern with bringing nano-imprint lithography to volume production is having access to an adequate template supply," Christopher Progler, Photronics CTO, said in a statement. "Partnerships are being established which improve Photronics' manufacturing capability. Our participation in several strategic initiatives are helping to build critical infrastructure such as process transfer, proof of concept demonstration, and template standardization."
The company, which is involved in a joint venture to bring imprint lithography to fruition, it will host a technology seminar on nano-imprint lithography during the Micro and Nano Engineering Conference (MNE) in Vienna, later this month. Participants will examine nano-imprint lithography applications, process development, metrology, electron beam lithography for template fabrication, template infrastructure development, and reticle enhancement technology (RET) options for the 45nm node and beyond.
Photronics began its development of nano-imprint templates in 2002 as an extension of its development efforts in chromeless phase lithography masks, alternating aperture phase shift masks and phase masks for photonics applications. In addition to being part of a National Institute of Standards and Technology - Advanced Technology Program for imprint lithography, Photronics has also fabricated imprint templates for tool vendors and end users in the areas of photonics, light emitting diodes, thin film head and a variety of emerging nano technology applications, according to the company.
Although there are several different techniques being developed concurrently for eventual use in chip applications, in simplest terms, imprint lithography involves physically imprinting a resist on a substrate and subsequently creating features following an etch step. Proponents of the technology maintain it is a potential next generation lithography technology, suggesting it could prove cost effective for small volume devices or for certain steps, such as contact holes, in devices produced in larger volumes.
