Tokyo Electron Limited (TEL) announced an extension to its collaboration on research into advanced lithography technologies with IMEC, an independent research center in nanoelectronics and nanotechnology. TEL will install two 300mm Clean Track systems at IMEC in 2006. The coater/developers will be used for research into EUV Lithography and Hyper NA 193nm Immersion Lithography.
TEL is to extend its partnership with IMEC by contributing a photoresist coater/developer system for use in IMEC's Industrial Affiliation Program on EUV lithography. This program will start in January 2006 and run for three years.
As an extension of the current collaboration on immersion lithography, TEL will also install a Clean Track Lithius I+ system for Hyper NA 193nm Immersion Lithography in Q1/2006. This tool will feature technologies specific to immersion lithography developed as a result of defectivity work carried out by IMEC and TEL using the Clean Track Act 12 currently installed at IMEC. The Lithius I+ will be interfaced to IMEC's ASML XT1700i to form an immersion lithography cluster.
TEL IMEC
