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NEC, Sony and Toshiba Bring 45-nanometer System LSI Process Technologies

(Top News, 06 Feb 2006 )

NEC Electronics Corporation, Sony Corporation, and Toshiba Corporation announced that the companies have agreed to jointly develop system LSI process technologies for the 45-nanometer (nm) generation.

In February 2004, Sony and Toshiba announced their collaboration on 45-nm system LSI process technology development, and have since proceeded with technology development based at Toshiba's Advanced Microelectronics Center in Yokohama, Japan. The results of their efforts have been reported and recognized at industry symposia. Likewise, NEC Electronics and Toshiba announced their agreement to jointly develop 45-nm process technology in November 2005, and have been in discussions to decide the details of that collaboration.

As a result of agreement, NEC Electronics' 45-nm development team will join Sony and Toshiba's ongoing work on 45-nm technology development at the Advanced Microelectronics Center. By combining the three companies' development resources, NEC Electronics, Sony, and Toshiba will raise development efficiency and further accelerate the pace of development, with the aim of establishing 45-nm system LSI process technology quickly.

Sony Corporation
Toshiba Corporation
NEC Electronics

 
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