Unaxis Wafer Processing, in deposition and etch solutions, announced their latest technology breakthrough allowing device manufacturers to descend to the 45nm technology node and beyond! The latest process demonstrate sub-3nm CD uniformity in Cr etch and 2 degree phase uniformity for advanced Quartz mask—enabling the manufacture of 45nm photomasks.
Dr. Peter Podesser, president of Unaxis Wafer Processing, said, "Unaxis is one of the companies leading the charge to 45 nm and below. In this nano era, Unaxis prides itself in providing customers with more than just a hardware solution. The Mask Etcher V combines all the right process technologies with material solutions providing cost-effective, viable options to address constantly evolving market dynamics."
