Blaze DFM Inc. said that it has strengthened its relationship with Taiwan Semiconductor Manufacturing Company (TSMC) to include TSMC support for Blaze MO optimization software. The two companies have developed Blaze MO design kits and are working together to make this technology available for evaluation.
Ed Wan, senior director of design service marketing, TSMC, said, “This announcement builds on the previously announced agreement for Blaze to join the TSMC DFM Compliance Initiative. We started working with Blaze at a very early stage. With Blaze MO, we see a good potential to reduce leakage and manufacturing variability."
Jacob Jacobsson, CEO, Blaze, stated, "Working with TSMC is clearly an ideal situation for Blaze. We are honored by the time and energy that TSMC has put into this project."
Working in conjunction with Blaze engineers, TSMC has developed 90nm and 65nm design kits for Blaze. These design kits include pre-qualified CD bias ranges, OPC directives and GDSII layer specifications for the TSMC-supported method of GDSII annotation. The TSMC Blaze enablement project also included the incorporation of Blaze MO annotations into the TSMC RET and mask data preparation flow.
Andrew Kahng, co-founder, CTO, and chairman of Blaze DFM, explained, "We worked diligently with TSMC to qualify the electrical and lithography impact of Blaze CD biasing decisions on the TSMC process. The design kits we have developed provide everything a customer needs from TSMC to add Blaze MO into their design flow."
Blaze DFM
