Fujitsu Limited and Advantest Corporation announced their agreement to establish a new joint venture, e-Shuttle Inc., to provide prototyping services for integrated circuit (LSI) semiconductors. e-Shuttle will use electron beam direct lithography technology that combines advanced semiconductor process technologies with electron beam exposure systems, to provide new LSI prototyping services for 65nm process technology. The services are scheduled to start in the first half of fiscal 2007.
e-Shuttle will develop electron beam direct lithography technology that can be applied to 65nm and 45nm process technologies. These technologies will be realized by combining Fujitsu's advanced semiconductor process technologies with Advantest's electron beam exposure system F3000 which was introduced to the market on October 24. The companies claims that e-Shuttle will be the world's first company to commercialize electron beam direct lithography for use on 300mm wafers for 65nm process technologies.
Fujitsu Advantest Corporation
