The MEMS Digital Twin Flow


Market forces are forcing MEMS teams to look at new methodologies. Time to market pressure, competitive pressure, FAB access and capacity are all driving MEMS designers to look for a more efficient methodology to tackle their toughest design challenges. Designers and Manufacturers alike are exploring options to improve yield, design robustness, and design differentiation.

Siemens EDA offers a novel flow for MEMS design, coupling the best-in-class Tanner L-Edit MEMS platform with partners SoftMEMS and OnScale to provide MEMS designers a truly unique method to parametrically design and simulate MEMS devices.


John Stabenow – Product Engineering Director, ICDS/Tanner Division

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